The miniaturization of organic semiconductor devices following the Moore’s law will open many new technological opportunities in ultrahigh-resolution displays and integrated photonics. However, traditional vacuum evaporation and inkjet printing methods are incompatible with the lithographic scaling processes that underpin silicon electronics, hindering true monolithic integration with complementary metal-oxide-semiconductor (CMOS) circuits. In this talk, I will present our recent progress in the development of top-down nanofabrication and particularly the bottom-up macromolecular synthesis of electroluminescent photoresists (ELPRs) synthesized via atom transfer radical polymerization (ATRP) that can be directly patterned by ultraviolet (UV) and electron beam lithography (EBL). Both approaches enabled us to pattern organic semiconductors with critical dimensions down to sub-100 nanometers. We validate their device performance with full-color, nanolithographic OLEDs exhibiting external quantum efficiencies (EQEs) exceeding 13%. These results not only pave the way for extending Moore's Law to organic optoelectronics but also unlock their potential for monolithic optoelectronic integration.